DC Bias Power Supply

The DC bias power supply is commonly used in electrical arc ion plating, DC magnetron sputtering, magnetron sputtering ion plating, unbalanced magnetron sputtering, and twin magnetron sputtering systems for substrate bias during film deposition.

The main features of these power inverters include: glow discharge substrate surface cleaning, ion bombardment during thin film deposition, substrate surface temperature control and so on. Using proper biasing parameters, one not only can avoid surface arcing to increase products yield but also can enhance surface smoothness and thin film/substrate adhesion.

Main Specification 

Model	Power	Working Voltage	Max. Working Current	Working Mode	Cooling Mode	Cabinet Dimension
BD-5	5kW	100-1000V	5A	CV	Wind	6U
		50-500V	10A
BD-10	10kW	100-1000V	10A	CV	Wind	6U
		50-500V	20A
BD-20	20kW	100-1000V	20A	CV	Water	7U
		50-500V	40A
BD-40	40kW	100-1000V	40A	CV	Water	1.2m cabinet
		50-500V	80A
BD-60	60kW	100-1000V	60A	CV	Water	1.6m cabinet
		50-500V	120A
BD-100	100kW	100-1000V	100A	CV	Water	1.8m cabinet
		50-500V	200A

CV: Constant Voltage;

Optional: Remote control by PLC

Related links