Linear Ion Source with uniform linear ion beam has been performed in PTL's Lehis model. The ion source can be performed in wide working pressure range from 3x10e-4 Torr to 8x10e-1 Torr and it also can be used to conduct diffused and collimated beam with wide energy range from several tens eV to keV. The gridless design with wide trench allows to have high ion density for high efficiency of etching/sputtering/surface cleaning/or deposition in industrial application.
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