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 Company news => Invited Talk in ICMAP 2011 Print】 【Back
Published date: [3/16/2011]    Read [4656] times
    Our scientific staff will give an invited presentation in the 3rd International Conference on Microelectronics and Plasma Technology (ICMAP 2011) in Dalian, China from 4th July to 7th July 2011. The title of the invited presentation is "Novel Instrumentation and Processes in Plasma Immersion Ion Implantation and Deposition". The subjects to be discussed include high voltage pulsed modulators, FCVA, HIPIMS/PIII processes, enhanced glow discharge ion implantation, and inner wall treatment of tubes. http://www.icmap2011.org _________________________________________________________________ _________________________________________________________________ 按此在新窗口浏览图片 按此在新窗口浏览图片 按此在新窗口浏览图片 按此在新窗口浏览图片
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