| Model |
: |
MSE-350 |
| Chamber |
: |
F 350mm x 400mm SS 304 steel ; Double-wall with water cooling, Top-opening |
| Pumping System |
: |
KYKY Turbo-molecular pump 600L/s and rotary pump 6L/s, pneumatic throttle valve, foreline valve, roughing valve and venting valve |
| Ultmate Pressure |
: |
Better than 8 x 10-5 Pa: From ATM to 2 x 10-4 Pa < 30 mins |
| Vacuum Measurement |
: |
2 Thermal gauges and 1 ion gauges with control displayer |
| Gas Feeding |
: |
2 MFCs 100SCCM with controller |
| Substrate Holder |
: |
F 120mm; Rotation speed 0-20RPM; PID temperature control from RT to 500oC +/-2oC |
| Substrate Bias |
: |
DC output (20V-100V); Pulse output (100V-1000V, 30kHz, 10%-80%) or DC superposed Pulse output |
| Sputtering Source |
: |
3 sets of sputter guns for confocal sputter-up deposition (2DC and 1 RF)
2-inches standard magnetron sputtering guns with pneumatic shutter;
Flexible joints for angle tilting;
Manually adjustable target to substrate distance: 80mm - 120mm;
13.56MHz, 500W RF power unit with manual matching network;
2kW DC magnetron power supply with constant current control |
| Interlock & Protection |
: |
Vacuum & cooling water interlock, over-current & over-voltage protection |
| Applications |
: |
Reactive deposition for nano-structured, nano-composited and multilayer of conductive, semi-conductive, insulating and opto-electrical films |
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